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17 October 2006 Reference pattern-based 2D measurement with nano resolution
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Proceedings Volume 6376, Optomechatronic Micro/Nano Devices and Components II; 63760M (2006)
Event: Optics East 2006, 2006, Boston, Massachusetts, United States
This paper presents a reference pattern-based two-dimensional (2D) measurement method. In the method, surface structure patterns obtained from a four-beam laser interference lithography (LIL) process were used as reference patterns for 2D measurement. The reference patterns played the role of 2D rulers in the measurement. The nano resolution of the measurement was achieved by feature counting and pattern matching techniques. A statistical analysis indicates that the measurement made by pattern matching has the advantage of averaging noise. For reference pattern-based 2D measurement, the reference patterns can be regular or irregular. This approach is potentially useful for micro and nano manipulation in the processes of assembly, packaging and manufacturing of nano and micro-systems when relative nano positioning accuracy is required.
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Zuobin Wang, Shizhong Su, Yury Konstantinovich Verevkin, and Sergej Fatikow "Reference pattern-based 2D measurement with nano resolution", Proc. SPIE 6376, Optomechatronic Micro/Nano Devices and Components II, 63760M (17 October 2006);

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