12 October 2006 Recent trends in white-light interferometry
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Proceedings Volume 6382, Two- and Three-Dimensional Methods for Inspection and Metrology IV; 638201 (2006) https://doi.org/10.1117/12.693634
Event: Optics East 2006, 2006, Boston, Massachusetts, United States
Abstract
The technique of surface profile measurement utilizing white-light interferometry is widely used in industry. However, it has certain shortcomings, such as slow measurement speed and the possibility of error caused by a transparent film on the surface. This paper introduces four of our recent developments in white-light interferometry: 1) speed improvement by sub-Nyquist sampling, 2) accuracy improvement through the use of phase information, 3) profiling of a thick transparent film, and 4) profiling of a thin transparent film.
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Katsuichi Kitagawa, Katsuichi Kitagawa, "Recent trends in white-light interferometry", Proc. SPIE 6382, Two- and Three-Dimensional Methods for Inspection and Metrology IV, 638201 (12 October 2006); doi: 10.1117/12.693634; https://doi.org/10.1117/12.693634
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