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12 October 2006 A comparison of wavelet multiresolution analysis and scale-space edge detection for lithography metrology
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Proceedings Volume 6383, Wavelet Applications in Industrial Processing IV; 63830H (2006) https://doi.org/10.1117/12.685872
Event: Optics East 2006, 2006, Boston, Massachusetts, United States
Abstract
We compared performance between the wavelet multiscale edge detection and the scale-space edge detection methods for lithography metrology. First, in order to determine a suitable wavelet, we evaluated the edge detection performance of the wavelet multiscale edge detection method with various types of wavelet families where a modeled SE signal of photoresist with shot noise was used. From the measurement results of average line widths and line edge roughnesses (LERs), the first-order derivative Gaussian wavelet was determined to be the suitable one for the measurement from SE signals of photoresist. Next, the performances were compared. As to the LER measurement, the difference between the two methods was little. However, for average line widths, the wavelet multiscale edge detection method had better performance than the scale-space edge detection method when SNR was lower than 5. Lastly, we applied the two methods to a noisy SEM image of photoresist. The wavelet multiscale edge detection method gave almost the same line width roughness as that of the scale-space edge detection method, though the former took a longer processing time. By setting the wavelet scale space properly, the processing time can be reduced.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshihiro Midoh, Koji Nakamae, and Hiromu Fujioka "A comparison of wavelet multiresolution analysis and scale-space edge detection for lithography metrology", Proc. SPIE 6383, Wavelet Applications in Industrial Processing IV, 63830H (12 October 2006); https://doi.org/10.1117/12.685872
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