Paper
29 September 2006 Femtosecond laser nanoprocessing using near-infrared nanojoule pulses at MHz repetition frequency
Karsten König, Herbert Schuck, Daniel Sauer, Frank Bauerfeld, Frank Stracke, Thomas Velten, Andrei Tchernook, Sven Martin, Ronan Le Harzic
Author Affiliations +
Proceedings Volume 6400, Femtosecond Phenomena and Nonlinear Optics III; 64000C (2006) https://doi.org/10.1117/12.691966
Event: Optics/Photonics in Security and Defence, 2006, Stockholm, Sweden
Abstract
Sub-80nm, sub-wavelength multiphoton nanoprocessing of silicon wafers as well as 3D maskless lithography by two two-photon polymerization in combination with five-dimensional (x,y,z, λ, τ) multiphoton analysis have been performed with the compact near infrared MHz femtosecond laser galvoscanning microscope FemtoCut (JenLab GmbH) as well as a modified ZEISS LSM510-NLO system. Laser excitation radiation was provided by a tuneable turnkey, one-box Chameleon as well as a MaiTai Ti:sapphire laser oscillator. Nanostructuring of silicon wafers with oil immersion objectives was based on NIR laser-induced periodic surface structures (LIPPS) likely due to selforganization processes. For the first time, periodic 70nm nanogrooves have been generated in wafers which is one order below the 800 nm laser wavelength by multiphoton phenomena at TW/cm2 transient intensities and low sub-3nJ pulse energies. Three-dimensional two-photon polymerization in SU-8 photoresists at GW/cm2 allowed rapid prototyping with sub-200nm precision. The same intensities have been used to image endogenous and exogenous fluorophores in a variety of materials for target finding and the evaluation of the nanoprocessing procedures.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karsten König, Herbert Schuck, Daniel Sauer, Frank Bauerfeld, Frank Stracke, Thomas Velten, Andrei Tchernook, Sven Martin, and Ronan Le Harzic "Femtosecond laser nanoprocessing using near-infrared nanojoule pulses at MHz repetition frequency", Proc. SPIE 6400, Femtosecond Phenomena and Nonlinear Optics III, 64000C (29 September 2006); https://doi.org/10.1117/12.691966
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KEYWORDS
Femtosecond phenomena

Near infrared

Nanoprocess

Silicon

Semiconducting wafers

Microscopes

Photoresist materials

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