15 January 2007 Femtosecond interaction processes near threshold: damage and ablation
Author Affiliations +
Abstract
Femtosecond laser ablation is an important process in micromachining and nanomachining of microelectronic, optoelectronic, biophotonic and MEMS components. It is also important in the damage of optical components and materials. A thorough understanding of all aspects of femtosecond matter interaction processes in the near-threshold regime is required if one wants to have complete control of these processes. Two aspects of the interaction process for metals and semiconductors are examined in detail in the present paper, namely the effect of a more complete model for the temperature dependent electron thermal conductivity in metals and the avalanche ionization process in semiconductors. These are included in two temperature and molecular dynamics modeling calculations respectively. The proper inclusion of these processes allows the model calculations to better reproduce published experimental measurements for copper and silicon.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Fedosejevs, S. E. Kirkwood, R. Holenstein, N. Young, Y. Y. Tsui, "Femtosecond interaction processes near threshold: damage and ablation", Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 640302 (15 January 2007); doi: 10.1117/12.697293; https://doi.org/10.1117/12.697293
PROCEEDINGS
10 PAGES


SHARE
Back to Top