Development of nanostructured titanium oxide thin-films using a gas carving technique

Deepak Dhawan; Ylias Sabri; Suresh Bhargava; Dinesh Sood; K. Kalantar-Zadeh

doi:10.1117/12.695539

20 December 2006 Development of nanostructured titanium oxide thin films using a gas carving technique

Deepak Dhawan, Ylias Sabri, Suresh Bhargava, Dinesh Sood, K. Kalantar-Zadeh

Proceedings Volume 6415, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III; 641514 (2006) https://doi.org/10.1117/12.695539
Event: SPIE Smart Materials, Nano- and Micro-Smart Systems, 2006, Adelaide, Australia

Abstract

A method is developed for producing nano-structured titanium oxide thin films using H₂ gas interaction with titanium thin film at a high temperature. These nano-structured thin films have been formed on a quartz crystal substrate. Titanium (Ti) thin films were deposited on the quartz crystal using a RF magnetron sputterer. The samples were placed in the oven at 500-800°C for 5 hours. The gas mixture of 1% H₂ in N₂ was introduced in the oven. The process of Ti annealing in the presence of H₂ carves Ti films into nano-structure shapes. The process is a gas-solid interaction. Thin films were characterised using Scanning Electron Microscopes (SEM) and X-Ray Diffraction (XRD) technique. The nano structures formed have dimensions in a range of 25nm - 150nm obtained after gas carving.

Citation Download Citation

Deepak Dhawan, Ylias Sabri, Suresh Bhargava, Dinesh Sood, and K. Kalantar-Zadeh "Development of nanostructured titanium oxide thin films using a gas carving technique", Proc. SPIE 6415, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III, 641514 (20 December 2006); https://doi.org/10.1117/12.695539

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