20 December 2006 Nanosphere lithography using thermal evaporation of gold
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Abstract
Nanosphere lithography, which allows for the fabrication of patterned metal surfaces, is a simple, effective and unconventional technique that exploits a self-assembly process. Using this technique, polystyrene nanospheres with diameters of 500nm, and 100nm were assembled onto a 'muscovite' mica substrate in a hexagonally close packed monolayer array, to provide a physical mask for material deposition. Thermal evaporation was subsequently used to deposit gold through the nanosphere mask layer, to generate a periodic array of gold nanostructures. Upon changing the mask to a multi-layered array of nanospheres, slightly more complex nanostructures were achieved. However due to thermal evaporation being a high temperature process the nanostructures obtained deviated from their predicted quasi triangular shape due to a slight annealing of the polystyrene mask.
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B. S. Flavel, J. G. Shapter, J. S. Quinton, "Nanosphere lithography using thermal evaporation of gold", Proc. SPIE 6415, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III, 64151J (20 December 2006); doi: 10.1117/12.695409; https://doi.org/10.1117/12.695409
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