Formation of silicon structures in silicate glass by femtosecond laser

Y. Shimotsuma; K. Miura; M. Sakakura; S. Kanehira; K. Hirao

doi:10.1117/12.707579

13 March 2007 Formation of silicon structures in silicate glass by femtosecond laser

Y. Shimotsuma, K. Miura, M. Sakakura, S. Kanehira, K. Hirao

Proceedings Volume 6458, Photon Processing in Microelectronics and Photonics VI; 64580L (2007) https://doi.org/10.1117/12.707579
Event: Lasers and Applications in Science and Engineering, 2007, San Jose, California, United States

Abstract

Femtosecond laser has been widely used in a light source for materials processing when high accuracy and small structure size are required. When a transparent material e.g. glass is irradiated by a tightly focused femtosecond laser, the photo-induced reaction is expected to occur only near the focused part of the laser beam inside the glass due to the multiphoton processes based on the ultrashort interaction time and the ultrahigh light intensity. We proposed a research idea of "induced structure" which means spatially modified micro- and nanostructures in a transparent material by the femtosecond laser irradiation. In this paper, we review our recent investigations on the three-dimensional nanostructure self-organization composed of oxygen deficiencies inside fused silica, the space-selective silicon structures formation in silicate glass based on thermite reaction triggered by femtosecond laser pulses, and diffusion of elements constituting glass based on thermal accumulation by high repetition rate femtosecond laser pulses. We also discuss the mechanisms and possible applications of the observed phenomena.

Citation Download Citation

Y. Shimotsuma, K. Miura, M. Sakakura, S. Kanehira, and K. Hirao "Formation of silicon structures in silicate glass by femtosecond laser", Proc. SPIE 6458, Photon Processing in Microelectronics and Photonics VI, 64580L (13 March 2007); https://doi.org/10.1117/12.707579

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