Patterning microconductor using nanosecond laser ablation of metal nanoparticle film

Sewoon Han; Taewong Lim; Jaewon Chung; Seung H. Ko; Costas P. Grigoropoulos; Dongjo Kim; Jooho Moon

doi:10.1117/12.701533

13 March 2007 Patterning microconductor using nanosecond laser ablation of metal nanoparticle film

Sewoon Han, Taewong Lim, Jaewon Chung, Seung H. Ko, Costas P. Grigoropoulos, Dongjo Kim, Jooho Moon

Proceedings Volume 6458, Photon Processing in Microelectronics and Photonics VI; 645811 (2007) https://doi.org/10.1117/12.701533
Event: Lasers and Applications in Science and Engineering, 2007, San Jose, California, United States

Abstract

Ablation of metal nanoparticle film using frequency doubled Nd:YAG nanosecond laser is explored to apply for trimming drop on demand (DOD) inkjet printed electrical micro-conductor for flexible electronics. While elevated rim structure due to expulsion of molten pool is observed in sintered nanoparticle film, the ablation of unsintered nanoparticle film results in a Gaussian-shaped ablation profile, so that a clean precise patterning is possible. In addition, the ablation fluence threshold of unsintered metal nanoparticle film is at least ten times lower than that of a corresponding metal film. Therefore, by using nanosecond laser ablation, inkjet printed metal nanoparticles compatible for flexible polymer can be patterned efficiently with a high resolution.

Citation Download Citation

Sewoon Han, Taewong Lim, Jaewon Chung, Seung H. Ko, Costas P. Grigoropoulos, Dongjo Kim, and Jooho Moon "Patterning microconductor using nanosecond laser ablation of metal nanoparticle film", Proc. SPIE 6458, Photon Processing in Microelectronics and Photonics VI, 645811 (13 March 2007); https://doi.org/10.1117/12.701533

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