7 March 2007 Nanogap experiments for laser cooling: a progress report
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Proceedings Volume 6461, Laser Cooling of Solids; 64610H (2007); doi: 10.1117/12.708585
Event: Lasers and Applications in Science and Engineering, 2007, San Jose, California, United States
Abstract
One of the challenges of laser cooling a semiconductor is the typically high index of refraction (greater than 3), which limits efficient light output of the upconverted photon. This challenge is proposed to be met with a novel concept of coupling the photon out via a thin, thermally insulating vacuum gap that allows light to pass efficiently by frustrated total internal reflection. This study has the goal of producing a test structure that allows investigation of heat transport across a 'nanogap' consisting of a thin film supported over a substrate by an array of nanometer-sized posts. The nanogap is fabricated monolithically by first creating a film of SiO2 on a silicon substrate, lithographically defining holes in the SiO2, and covering this structure including the holes with silicon. Selective lateral etching will then remove the SiO2, leaving behind a thin gap between two Si layers spaced apart by nanometer-scale Si posts. Demonstration of this final step by successfully undercutting the a-Si upper layer due to the hydrophobic nature of silicon and the slow etch rate of buffered oxide etch in the small gap has proved to be problematic. Arriving at a feasible solution to this conundrum is the current objective of this project in order to begin investigating the thermal conductivity properties of the structure.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryan P. Martin, Josef Velten, Andreas Stintz, Kevin J. Malloy, Richard I. Epstein, Mansoor Sheik-Bahae, Michael P. Hasselbeck, Babak Imangholi, S. T. P. Boyd, Todd M. Bauer, "Nanogap experiments for laser cooling: a progress report", Proc. SPIE 6461, Laser Cooling of Solids, 64610H (7 March 2007); doi: 10.1117/12.708585; https://doi.org/10.1117/12.708585
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KEYWORDS
Silicon

Etching

Amorphous silicon

Scanning electron microscopy

Semiconducting wafers

Semiconductor lasers

Silicon films

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