8 February 2007 Holographic optical elements for the extreme-ultraviolet regime
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Abstract
As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such component is the diffractive optical element used, for example, in illumination systems to efficiently generate modified pupil fills. Here we demonstrate the fabrication and characterization of EUV binary phase-only computer-generated holograms allowing arbitrary far-field diffraction patterns to be generated.
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Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, Erik H. Anderson, "Holographic optical elements for the extreme-ultraviolet regime", Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64620S (8 February 2007); doi: 10.1117/12.712345; https://doi.org/10.1117/12.712345
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