7 March 2007 Implementation of far-field phase-shift lithography using diffractive optical elements
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Abstract
We proposed a method, which is the first to our knowledge, to realize the phase-shift patterns of the near-field lithography in the optical far field. The key component of the optical Fourier system was a phase-only diffractive optical element which generated a diffracted light field of a semi-phase-only complex-valued function. The achieved feature size was beyond the diffraction limit. The advantages of the proposed method included the capability to generate the complicated patterns, spatial parallelism, and low cost.
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Wei-Feng Hsu, Wei-Feng Hsu, Yuan-Hong Su, Yuan-Hong Su, } "Implementation of far-field phase-shift lithography using diffractive optical elements", Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64621C (7 March 2007); doi: 10.1117/12.699950; https://doi.org/10.1117/12.699950
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