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7 March 2007 Implementation of far-field phase-shift lithography using diffractive optical elements
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We proposed a method, which is the first to our knowledge, to realize the phase-shift patterns of the near-field lithography in the optical far field. The key component of the optical Fourier system was a phase-only diffractive optical element which generated a diffracted light field of a semi-phase-only complex-valued function. The achieved feature size was beyond the diffraction limit. The advantages of the proposed method included the capability to generate the complicated patterns, spatial parallelism, and low cost.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wei-Feng Hsu and Yuan-Hong Su "Implementation of far-field phase-shift lithography using diffractive optical elements", Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64621C (7 March 2007);

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