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20 February 2007 Enhancement of gas response of ZnO micro-nano structured films through plasma treatment
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Films of ZnO micro-nano structures were deposited on quartz substrates and subsequently plasma treated in O2, N2 and CF4. It was found that exposure to oxygen plasma enhanced gas response to ethanol vapor of the ZnO films by a factor 2. The effect of surface plasma treatments on the gas response of the ZnO films was discussed in reference to surface morphology observed by high-magnification SEM and surface chemical state determined by XPS. SEM observation revealed that O2 plasma treatment induced less surface roughening than N2 and CF4 plasmas, in agreement with the view that O2 plasma should reduce preferential sputtering. Deconvolution of the O 1s X-ray photoelectron peak indicated an increase in the Zn-O bond surface density relatively to O-H bond density for the O2 plasma treated surface, whereas the O-H bond surface density was increased relatively to the Zn-O bond density for the N2 and CF4 plasma treated films. The O2 plasma was found to partially clean the surface from hydroxyl groups and to expose more Zn cations, which might have caused the enhancement of sensor response by increasing the density of active sites for oxidation/reduction reactions.
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Jean-Jacques Delaunay, Kazumasa Yanagisawa, Toshiki Nishino, and Ichiro Yamada "Enhancement of gas response of ZnO micro-nano structured films through plasma treatment", Proc. SPIE 6474, Zinc Oxide Materials and Devices II, 64741G (20 February 2007);

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