9 February 2007 Distributed subwavelength grating demultiplexer in SOI
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Proceedings Volume 6475, Integrated Optics: Devices, Materials, and Technologies XI; 64750C (2007); doi: 10.1117/12.700709
Event: Integrated Optoelectronic Devices 2007, 2007, San Jose, California, United States
Abstract
A shallow-etched, distributed grating is proposed as a wavelength demultiplexer. The distributed grating constitutes a structure with completely decoupled reflective and diffractive properties. The theory behind the layout of the distributed grating is presented. The structure is modeled using RCWA and FDTD. Modeling results predict up to 79% efficiency over a 60nm wavelength range. Device fabrication results are presented. Early optical characterization of a test structure confirms the expected behavior for the device.
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Eric Bisaillon, Dawn T. H. Tan, Marie-Claude Nadeau, Lukas Chrostowski, Andrew Kirk, "Distributed subwavelength grating demultiplexer in SOI", Proc. SPIE 6475, Integrated Optics: Devices, Materials, and Technologies XI, 64750C (9 February 2007); doi: 10.1117/12.700709; https://doi.org/10.1117/12.700709
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KEYWORDS
Waveguides

Diffraction gratings

Demultiplexers

Etching

Diffraction

Finite-difference time-domain method

Beam propagation method

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