Preparation of surfactant-induced nanoporous polymer film

Se-Chul Lee; Hyun Suk Kim; In-Joo Chin

doi:10.1117/12.707307

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9 February 2007 Preparation of surfactant-induced nanoporous polymer film

Se-Chul Lee, Hyun Suk Kim, In-Joo Chin

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Proceedings Volume 6476, Optoelectronic Integrated Circuits IX; 64760Z (2007) https://doi.org/10.1117/12.707307
Event: Integrated Optoelectronic Devices 2007, 2007, San Jose, California, United States

Abstract

Nanoporous polymer films were prepared by using surfactant as porogen in order to be used as optical waveguides. We prepared porous polymer films by spin-coating of PMMA solutions containing surfactant (NaDDBS) at concentrations higher than the critical micelle concentration (CMC). The pore structure of the films was affected by such factors as the type of the pore generator (porogen) and solvent, the molecular weight of the polymer, and processing parameters. After removal of NaDDBS, the nanoporous structure was observed via FE-SEM. Since the resulting pore size is much smaller than the wavelength of the visible light, the nanoporous thin films were optically homogeneous. The refractive index was given by an average over the film, and it was controlled by changing the amount of the surfactant in the film. The refractive index of the nanoporous polymer film was found to decrease with the increase in the pore volume ratio.

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Se-Chul Lee, Hyun Suk Kim, and In-Joo Chin "Preparation of surfactant-induced nanoporous polymer film", Proc. SPIE 6476, Optoelectronic Integrated Circuits IX, 64760Z (9 February 2007); https://doi.org/10.1117/12.707307

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