6 February 2007 A study by GISAXS of PbTe/SiO2 multilayer deposited on Si(111)
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Abstract
Multilayers of PbTe quantum dots embedded in SiO2 were fabricated by alternatively use of Laser Ablation and Plasma Enhanced Chemical Vapor Deposition techniques. A set o samples containing different PbTe nanoparticles sizes was prepared for the study. The morphological properties of the nanostructured material were studied by means of grazing-incidence small-angle X-ray scattering (GISAXS) and x-ray reflectometry (XRR) techniques. A preliminary analysis of the GISAXS spectra provided information about the multilayer periodicity and its relationship to the size of the deposited PbTe nanoparticles.
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G. Kellermann, E. Rodriguez, E. Jimenez, E. Chillcce, C. L. Cesar, L. C. Barbosa, "A study by GISAXS of PbTe/SiO2 multilayer deposited on Si(111)", Proc. SPIE 6481, Quantum Dots, Particles, and Nanoclusters IV, 64810A (6 February 2007); doi: 10.1117/12.701082; https://doi.org/10.1117/12.701082
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