Development of optics for EUV lithography tools

Katsuhiko Murakami; Tetsuya Oshino; Hiroyuki Kondo; Hiroshi Chiba; Hideki Komatsuda; Kazushi Nomura; Hiromitsu Iwata

doi:10.1117/12.711738

15 March 2007 Development of optics for EUV lithography tools

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Hiromitsu Iwata

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65170J (2007) https://doi.org/10.1117/12.711738
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Nikon is now conducting a development of the full-field EUV exposure tools for EUVL process development named EUV1, which will be delivered in 2007. Polishing and coating of six different kinds of mirrors for the projection optics of EUV1 were finished and adjustment of the projection optics has been started. Sophisticated polishing process for aspheric mirrors, which can reduce LSFR, MSFR and HSFR down to less than 0.1nmRMS simultaneously, were developed. Process conditions of Mo/Si multilayer coatings have been optimized to obtain high reflectivity, low internal stress and graded coating simultaneously. Wavefront error of the projection optics under adjustment process is now 3nmRMS. We will try to achieve a wavefront error of less than 1nmRMS by further precise adjustment. Fabrication process of fly's eye mirrors, which is a key device of illumination optics of EUV1, was developed. All the mirrors of the illumination optics for EUV1 were finished and evaluation of its performance using an illumination-optics test stand has been started. Development and fabrication of both the projection optics and the illumination optics for EUV1 are satisfactorily in progress.

Citation Download Citation

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, and Hiromitsu Iwata "Development of optics for EUV lithography tools", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170J (15 March 2007); https://doi.org/10.1117/12.711738

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