19 March 2007 Photonic band-gap masks to enhance resolution and depth of focus
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The authors introduce initial simulation work on Photonic Bandgap Enhanced or PBE reticles that tends to address the manufacturing problems associated with typical PSM reticles while improving potential resolution capabilities to 35 and 25 nm utilizing 193 nm immersion lithography. The proposed approach for manufacturing reduces the overall defect issues associated with PSM approaches.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John Nistler, John Nistler, Koby Duckworth, Koby Duckworth, Jiri Chaloupka, Jiri Chaloupka, Matt Brock, Matt Brock, "Photonic band-gap masks to enhance resolution and depth of focus", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171F (19 March 2007); doi: 10.1117/12.712295; https://doi.org/10.1117/12.712295

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