15 March 2007 Molecular-ruler nanolithography
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Abstract
Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.
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Charan Srinivasan, J. Nathan Hohman, Mary E. Anderson, Pengpeng Zhang, Paul S. Weiss, Mark W. Horn, "Molecular-ruler nanolithography", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171I (15 March 2007); doi: 10.1117/12.712230; https://doi.org/10.1117/12.712230
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