15 March 2007 Molecular-ruler nanolithography
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Abstract
Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Charan Srinivasan, Charan Srinivasan, J. Nathan Hohman, J. Nathan Hohman, Mary E. Anderson, Mary E. Anderson, Pengpeng Zhang, Pengpeng Zhang, Paul S. Weiss, Paul S. Weiss, Mark W. Horn, Mark W. Horn, } "Molecular-ruler nanolithography", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171I (15 March 2007); doi: 10.1117/12.712230; https://doi.org/10.1117/12.712230
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