Status and path to a final EUVL reticle-handling solution

Long He; Kevin Orvek; Phil Seidel; Stefan Wurm; Jon Underwood; Ernie Betancourt

doi:10.1117/12.712872

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15 March 2007 Status and path to a final EUVL reticle-handling solution

Long He; Kevin Orvek; Phil Seidel; Stefan Wurm; Jon Underwood; Ernie Betancourt

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Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171O (2007) https://doi.org/10.1117/12.712872
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In extreme ultraviolet lithography (EUVL), the lack of a suitable material to build conventional pellicles calls for industry standardization of new techniques for protection and handling throughout the reticle's lifetime. This includes reticle shipping, robotic handling, in-fab transport, storage, and uses in atmospheric environments for metrology and vacuum environments for EUV exposure. In this paper, we review the status of the industry-wide progress in developing EUVL reticle-handling solutions. We show the industry's leading reticle carrier approaches for particle-free protection, such as improvements in conventional single carrier designs and new EUVL-specific carrier concepts, including variations on a removable pellicle. Our test indicates dual pod approach of the removable pellicle led to nearly particle-free use during a simulated life cycle, at ~50nm inspection sensitivity. We will provide an assessment of the remaining technical challenges facing EUVL reticle-handling technology. Finally, we will review the progress of the SEMI EUVL Reticle-handling Task Force in its efforts to standardize a final EUV reticle protection and handling solution.

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Long He, Kevin Orvek, Phil Seidel, Stefan Wurm, Jon Underwood, and Ernie Betancourt "Status and path to a final EUVL reticle-handling solution", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171O (15 March 2007); https://doi.org/10.1117/12.712872

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