Structure and stability characterization of anti-adhesion self-assembled monolayers formed by vapor deposition for NIL use

Sophie Garidel; Marc Zelsmann; Pauline Voisin; Nevine Rochat; Philippe Michallon

doi:10.1117/12.711417

21 March 2007 Structure and stability characterization of anti-adhesion self-assembled monolayers formed by vapour deposition for NIL use

Sophie Garidel, Marc Zelsmann, Pauline Voisin, Nevine Rochat, Philippe Michallon

Author Affiliations +

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65172C (2007) https://doi.org/10.1117/12.711417
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Anti-sticking efficiency remains a key issue in nanoimprint lithography. In order to address this problem, a selfassembled monolayer (SAM) of a fluorinated silane release agent is generally applied to the stamp surface, either in wet or in vapour phase. We present here the study on vapour deposition of (tridecafluoro-1,1,2,2-tetrahydrooctyl)TriChloroSilane (F₁₃-TCS) and wet and vapour deposition of a commercial product, OPTOOL DSX from Daikin. They are both fluorinated silanes used for the formation of anti-adhesive layers in nanoimprint lithography. Results will be compared in term of anti-adhesion properties and homogeneity for the obtained layers. Characterizations are made by means of contact angle measurements, Fourier Transform Infra-Red analysis and Atomic Force Microscopy observations. The vapour phase deposition of F₁₃-TCS allows us to reach surface energies as low as 11mN/m without increasing initial roughness. OPTOOL DSX^TM deposition in wet phase presents comparable results, but with an increased roughness mainly due to the deposition procedure. The durability of the formed layers was investigated as a function of number of prints. For both materials, a significant degradation of the anti-adhesion properties occurs after few imprinted dies.

Citation Download Citation

Sophie Garidel, Marc Zelsmann, Pauline Voisin, Nevine Rochat, and Philippe Michallon "Structure and stability characterization of anti-adhesion self-assembled monolayers formed by vapour deposition for NIL use", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65172C (21 March 2007); https://doi.org/10.1117/12.711417

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