21 March 2007 High-accuracy EUV reflectometer
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Abstract
Developers and users of EUV-optics need precise tools for the characterization of their products. Often a measurement accuracy of 0.1% or better is desired to detect and study slow-acting aging effect or degradation by organic contaminants. To achieve a measurement accuracy of 0.1% an EUV-source is required which provides an excellent long-time stability, namely power stability, spatial stability and spectral stability. Naturally, it should be free of debris. An EUV-source particularly suitable for this task is an advanced electron-based EUV-tube. This EUV source provides an output of up to 300 μW at 13.5 nm. Reflectometers benefit from the excellent long-time stability of this tool. We design and set up different reflectometers using EUV-tubes for the precise characterisation of EUV-optics, such as debris samples, filters, multilayer mirrors, grazing incidence optics, collectors and masks. Reflectivity measurements from grazing incidence to near normal incidence as well as transmission studies were realised at a precision of down to 0.1%. The reflectometers are computer-controlled and allow varying and scanning all important parameters online. The concepts of a sample reflectometer is discussed and results are presented. The devices can be purchased from the Laser Zentrum Hannover e.V.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
U. Hinze, U. Hinze, M. Fokoua, M. Fokoua, B. Chichkov, B. Chichkov, } "High-accuracy EUV reflectometer", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651732 (21 March 2007); doi: 10.1117/12.712853; https://doi.org/10.1117/12.712853
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