21 March 2007 Fabrication of fine pitch gratings by holography, electron beam lithography and nano-imprint lithography
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Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651734 (2007); doi: 10.1117/12.712212
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States
Abstract
Fine pitch gratings (200 nm - 240 nm) are required for a variety of devices such as optical filters, semiconductor lasers and sensors for bio-medical applications. Various lithographic techniques are commercially available for fabricating gratings, with the choice depending on the type of grating required, cost and volume of manufacture. It is possible to use state of the art high-resolution projection steppers, common to silicon device manufacturing, for half pitch gratings down to 65 nm, but for much smaller volume manufacturing of photonic devices these tools have a prohibitive cost of ownership. Thus, remaining techniques for sub 120 nm half pitch gratings are holography, electron beam lithography, and nano-imprint lithography. In this paper we compare, characterize, and discuss the practical application of these three methods. Examples of gratings fabricated at the Canadian Photonics Fabrication Centre (CPFC) are shown as well as some application examples.
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Darren Goodchild, Alexei Bogdanov, Simon Wingar, Bill Benyon, Nak Kim, Frank Shepherd, "Fabrication of fine pitch gratings by holography, electron beam lithography and nano-imprint lithography", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651734 (21 March 2007); doi: 10.1117/12.712212; https://doi.org/10.1117/12.712212
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KEYWORDS
Holography

Electron beam lithography

Lithography

Semiconducting wafers

Reflectivity

Diffraction gratings

Scanning electron microscopy

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