Microfocus EUV tube for at-wavelength reflectometry

André Egbert; Stefan Becker

doi:10.1117/12.706126

21 March 2007 Microfocus EUV tube for at-wavelength reflectometry

André Egbert, Stefan Becker

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651739 (2007) https://doi.org/10.1117/12.706126
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Reliable and compact extreme ultraviolet (EUV) laboratory sources are strongly required for in-house characterization of optical components and for the precise calibration of EUV diagnostic instruments. The EUV tube, based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range around 13.5 nm, is an important tool for these applications. Great benefits of this source are a compact and flexible design, debris-free operation, and high temporal and spatial long-term stability. Detailed characteristics of the source performance are reported and different examples for at-wavelength metrology are presented.

Citation Download Citation

André Egbert and Stefan Becker "Microfocus EUV tube for at-wavelength reflectometry", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651739 (21 March 2007); https://doi.org/10.1117/12.706126

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