21 March 2007 Small field exposure tool (SFET) light source
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Abstract
A laser produced plasma light source for a small field exposure tool (SFET) has been developed at the EUVA Hiratsuka R&D center. The light source consists of the following components: The drive laser of the xenon plasma source is a short-pulse, high-power KrF laser that has been developed in cooperation with Gigaphoton Inc. and Komatsu Ltd. The laser has an unstable resonator and produces a maximum output power of 580W at 4kHz repetition rate. The xenon target is a 50 micrometer diameter liquid jet with a speed of about 35 m/s. The source has been designed to generate 0.5W in-band power at the intermediate focus (IF) at a collecting solid angle of pi sr. The source includes automatic control, e.g. jet and plasma position control, and an electrical interface for the exposure tool. The performance of the source at IF has been evaluated by Canon Inc. This paper explains source performances. Especially, results of IF parameters like image size, position stability and out of band radiation are presented.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tamotsu Abe, Tamotsu Abe, Takashi Suganuma, Takashi Suganuma, Masato Moriya, Masato Moriya, Takayuki Yabu, Takayuki Yabu, Takeshi Asayama, Takeshi Asayama, Hiroshi Someya, Hiroshi Someya, Yoshifumi Ueno, Yoshifumi Ueno, Georg Soumagne, Georg Soumagne, Akira Sumitani, Akira Sumitani, Hakaru Mizoguchi, Hakaru Mizoguchi, } "Small field exposure tool (SFET) light source", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65173C (21 March 2007); doi: 10.1117/12.711241; https://doi.org/10.1117/12.711241
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