High repetition rate LPP source facility for EUVL

T. Schmid; S. A. George; J. Cunado; S. Teerawattanasook; R. Bernath; C. Brown; K. Takenoshita; C.-S. Koay; M. Richardson

doi:10.1117/12.713457

22 March 2007 High repetition rate LPP source facility for EUVL

T. Schmid, S. A. George, J. Cunado, S. Teerawattanasook, R. Bernath, C. Brown, K. Takenoshita, C.-S. Koay, M. Richardson

Author Affiliations +

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65173I (2007) https://doi.org/10.1117/12.713457
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In this work we present the status of our high repetition-rate/high power EUV source facility. The masslimited target concept has demonstrated high conversion efficiencies (CE) previously, with precision solid state lasers. Currently, experiments are in progress with high power high repetition-rate (3-4 kHz) Qswitched laser modules. We present a new dedicated facility for the high power EUV source. Also, we present a precision EUV energy-meter, which is developed for absolute EUV energy measurements. Spectral measurements of the tin-doped droplet laser plasma are performed with a flat-field spectrometer (FFS) with a back-illuminated CCD camera. We address the issue of maintaining the calibration of the EUV optics during source operation at non-optimum intensity at high repetition-rate, which is required for CE improvement studies. Here we present the unique metrology for measuring EUV energies under a variety of irradiation conditions without degrading EUV optics, even at high repetition rates (multi-kHz).

Citation Download Citation

T. Schmid, S. A. George, J. Cunado, S. Teerawattanasook, R. Bernath, C. Brown, K. Takenoshita, C.-S. Koay, and M. Richardson "High repetition rate LPP source facility for EUVL", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65173I (22 March 2007); https://doi.org/10.1117/12.713457

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