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Automatic setup of in-line critical dimension (CD) recipes during OPC qualification in a foundry environment
Evaluation of CD-SEM measurement uncertainty using secondary electron simulation with charging effect
Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes
Single crystal critical dimension reference materials (SCCDRM): process optimization for the next generation of standards
Comparison and uncertainties of standards for critical dimension atomic force microscope tip width calibration
Impact of thin film metrology on the lithographic performance of 193-nm bottom antireflective coatings
Beyond measurement uncertainty: improving the productivity of metrology tools through recipe error analysis