Application of perturbation methods in optical scatterometry

B. C. Bergner; T. J. Suleski

doi:10.1117/12.712291

5 April 2007 Application of perturbation methods in optical scatterometry

B. C. Bergner, T. J. Suleski

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 651829 (2007) https://doi.org/10.1117/12.712291
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Optical scattering techniques can provide rapid, non-destructive measurements of nanometer-scale structures for micro-fabrication process control. In general, these techniques compare measured optical characteristics of a sample to results generated from a theoretical model. The models can be computationally expensive, especially when used with iterative methods to obtain a solution to the inverse problem. However, the structures of interest are normally restricted to small changes from some nominal structure. Perturbation theories have been used to efficiently calculate the effects of small changes on the performance of photonic crystals. In this paper, we apply these perturbation techniques to the optical scatterometry problem and demonstrate a calculation of the change in the scattered signal due to edge roughness from an array of holes in a dielectric.

Citation Download Citation

B. C. Bergner and T. J. Suleski "Application of perturbation methods in optical scatterometry", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651829 (5 April 2007); https://doi.org/10.1117/12.712291

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