5 April 2007 Thermal imaging of a lithography cell, including exposure tool, using a self-contained instrumented wafer
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Abstract
A spatial and temporal thermal image of a lithography cell from resist dispense through develop is obtained with a novel instrumented wafer. The wireless sensing wafer was able detect temperature changes the occurred during the photoresist dispense and exposure steps as well as in the photoresist bake steps.
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Zach Reid, Zach Reid, Mark Wiltse, Mark Wiltse, Sandy Burgan, Sandy Burgan, Gregory Roche, Gregory Roche, "Thermal imaging of a lithography cell, including exposure tool, using a self-contained instrumented wafer", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183S (5 April 2007); doi: 10.1117/12.714231; https://doi.org/10.1117/12.714231
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