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5 April 2007 Angular scatterometry for line-width roughness measurement
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Abstract
We propose using angular scatterometry as a means to investigate LWR (line-width roughness) and CD (critical dimension). The grating target is illuminated by a single wavelength light source which has large angular aperture both in incidence angle θ and azimuth angle φ. A preliminary scatterometry model was first built by assuming perfect critical dimension printed without any line-width roughness. The difference between the model prediction and actual measurement is cased by line-width roughness contribution. We developed a calibration curve as a function of line-width roughness based on the statistical quantity of the incidence and azimuth angle dependence. The results demonstrate that scatterometry can indeed be used to extract line-width roughness and critical dimension information in production line with nano-scale resolution.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Deh-Ming Shyu, Yi-Sha Ku, and Nigel Smith "Angular scatterometry for line-width roughness measurement", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65184G (5 April 2007); https://doi.org/10.1117/12.711734
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