Emerging patterning materials: trends, challenges, and opportunities in patterning and materials by design

Daniel J. C. Herr

doi:10.1117/12.721750

6 April 2007 Emerging patterning materials: trends, challenges, and opportunities in patterning and materials by design

Daniel J. C. Herr

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651903 (2007) https://doi.org/10.1117/12.721750
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Patterning technology is entering the nanomaterials era. Breakthrough advances in the basic sciences over the last twenty years are catalyzing novel material and assembly options. In the near future, these options may warrant consideration for fabricating advanced information processing technologies. However, material technology advances alone are not sufficient to induce changes and chemical substitution in manufacturing. In fact, manufacturing technology will change only when no other option exists. Therefore, the concurrent trend in lithographic challenges is noteworthy. Recent revisions of the International Technology Roadmap for Semiconductors (ITRS) indicate that it is becoming increasingly difficult for mainstream lithographic technologies to satisfy projected ITRS dimensional scaling requirements, shown in Table 1.

Citation Download Citation

Daniel J. C. Herr "Emerging patterning materials: trends, challenges, and opportunities in patterning and materials by design", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651903 (6 April 2007); https://doi.org/10.1117/12.721750

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