Patterning of biomolecules on a biocompatible nonchemically amplified resist

Jin-Baek Kim; Ramakrishnan Ganesan; So Young Yoo; Jae-Hak Choi; Sang Yup Lee

doi:10.1117/12.712102

12 April 2007 Patterning of biomolecules on a biocompatible nonchemically amplified resist

Jin-Baek Kim, Ramakrishnan Ganesan, So Young Yoo, Jae-Hak Choi, Sang Yup Lee

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65191L (2007) https://doi.org/10.1117/12.712102
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A simple lithographic process in conjunction with a novel biocompatible nonchemically amplified photoresist material was successfully used for the patterning of biomolecules such as cells and proteins. UV light irradiation on selected regions of the nonchemically amplified resist film renders the exposed regions hydrophilic by the formation of carboxylic groups. Mouse fibroblast cells were found to be preferentially aligned and proliferated on the UV light exposed regions of the nonchemically amplified resist film, where carboxylic groups were present. For streptavidin patterning, amine-terminated biotin was linked to the carboxylic groups of the UV light exposed regions, which was further used to bind streptavidin to the UV light exposed regions.

Citation Download Citation

Jin-Baek Kim, Ramakrishnan Ganesan, So Young Yoo, Jae-Hak Choi, and Sang Yup Lee "Patterning of biomolecules on a biocompatible nonchemically amplified resist", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191L (12 April 2007); https://doi.org/10.1117/12.712102

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