Paper
2 April 2007 Contact angles and structure/surface property relationships of immersion materials
Author Affiliations +
Abstract
Surface properties of materials are an important, even vital, consideration in immersion lithography. Many investigations have shown that sessile drop static contact angles are not entirely useful in the design of high performance immersion lithography surfaces. We have synthesized and characterized a broad family of "hydrophobic" materials and this paper will share information on the role of molecular structure on contact angles and hysteresis of these immersion materials. Insight into the relationship between structure and contact angles for future immersion materials will be presented.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Linda K. Sundberg, Daniel P. Sanders, Ratnam Sooriyakumaran, Phillip J. Brock, and Robert D. Allen "Contact angles and structure/surface property relationships of immersion materials", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191Q (2 April 2007); https://doi.org/10.1117/12.712632
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Fluorine

Polymers

Immersion lithography

Surface properties

Semiconducting wafers

Carbon

Lithography

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