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6 April 2007 Organic ArF bottom anti-reflective coatings for immersion lithography
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Abstract
Substrate reflectivity control plays an important role in immersion lithography. Multilayer bottom anti-reflective coatings (B.A.R.C.s) become necessary. This paper will focus on the recent development in organic ArF B.A.R.C. for immersion lithography. Single layer low k ArF B.A.R.C.s in conjunction with multilayer CVD hard mask and dual layer organic ArF B.A.R.C. application will be discussed. High NA dry and wet lithography data will be presented. We will also present the etch rate data, defect data and out-gassing property of these new B.A.R.C. materials.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhong Xiang, Hong Zhuang, Hengpeng Wu, Jianhui Shan, Dave Abdallah, Jian Yin, Salem Mullen, Huirong Yao, Eleazar Gonzalez, and Mark Neisser "Organic ArF bottom anti-reflective coatings for immersion lithography", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651929 (6 April 2007); https://doi.org/10.1117/12.710669
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