Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group

Liyuan Wang; Xiaoxiao Zhai; Yongen Huo

doi:10.1117/12.711703

2 April 2007 Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group

Liyuan Wang, Xiaoxiao Zhai, Yongen Huo

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65192H (2007) https://doi.org/10.1117/12.711703
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

1,3-adamantanedicarboxylic acid and acrylpimaric acid were reacted with an aliphatic divinyl ether, 1,4-cyclohexanedimethanol divinyl ether, to give novel ester acetal polymers without phenyl group. These polymers can be dissolved in common solvents and possess high thermal stability. The ester acetal polymer can be quickly decomposed at the presence of strong acid generated by PAG above 100°C and become easily soluble in dilute aqueous base. Two-component photopolymer consisting of the ester acetal polymer and PAG can be used as positive photoresists. The polymer derived from 1,3-adamantanedicarboxylic acid displayed higher transparency at 193 nm and can be used for 193 nm photoresist.

Citation Download Citation

Liyuan Wang, Xiaoxiao Zhai, and Yongen Huo "Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192H (2 April 2007); https://doi.org/10.1117/12.711703

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