Two-component photoresists based on acidolytic cleavage of novel ester acetal polymer

Liyuan Wang; Zhanxing Chu; Long Cheng

doi:10.1117/12.711701

2 April 2007 Two-component photoresists based on acidolytic cleavage of novel ester acetal polymer

Liyuan Wang, Zhanxing Chu, Long Cheng

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65192I (2007) https://doi.org/10.1117/12.711701
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The reaction of acrylpimaric acid and several divinyl ether compounds, including 1,3-Bis(2-(vinyloxy)ethoxy)benzene, 2,2-bis(4-[2-(vinyloxy)ethoxy]phenyl)propane, and 1,4-Bis(2-(vinyloxy)ethoxy)benzene, can take place in the presence of organic solvents to form novel ester acetal polymer with the average molecular weight of 4000-6000(M_n) measured by GPC. These polymers can be easily dissolved in common solvents and show high thermal stability. The ester acetal polymers can be quickly acidolyzed at the presence of strong acid generated by PAG above 100^oC and become easily soluble in dilute aqueous base. Two-component positive photoresists can be formed by the ester acetal polymer and PAG. The lithographic performance of the resist material composed of the ester acetal polymer and a sulfonium triflate PAG was studied on i-line exposure instrument. Clear pattern with 2 &mgr;m resolution was obtained and the photosensitivity was below 20mj/cm².

Citation Download Citation

Liyuan Wang, Zhanxing Chu, and Long Cheng "Two-component photoresists based on acidolytic cleavage of novel ester acetal polymer", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192I (2 April 2007); https://doi.org/10.1117/12.711701

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