Optimization of material and process parameter for minimizing defect in implementation of MFHM process

Kilyoung Lee; Junggun Heo; Keundo Ban; Hyungsuk Seo; Geunsu Lee; Wonkyu Kim; Junhee Cho; Junhyeub Sun; Sungkwon Lee; Cheolkyu Bok; Seungchan Moon; Jinwoong Kim

doi:10.1117/12.712406

30 March 2007 Optimization of material and process parameter for minimizing defect in implementation of MFHM process

Kilyoung Lee, Junggun Heo, Keundo Ban, Hyungsuk Seo, Geunsu Lee, Wonkyu Kim, Junhee Cho, Junhyeub Sun, Sungkwon Lee, Cheolkyu Bok, Seungchan Moon, Jinwoong Kim

Author Affiliations +

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65192Y (2007) https://doi.org/10.1117/12.712406
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Silicon-containing material has recently attracted attention as new hard mask material. We have studied the applicability of MFHM (Multi-Functional Hard Mask)/SOC (Spin on Carbon) materials as an alternative to the BARC/SiON/ amorphous carbon (a-C) process. This process is very useful in terms of cost reduction and process simplicity compared to a-C process. Evaluation results have showed good lithographic and etch performances. However, this MFHM process has showed specific defects related to material. This paper will focus on defect type and suggest its solution.

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Kilyoung Lee, Junggun Heo, Keundo Ban, Hyungsuk Seo, Geunsu Lee, Wonkyu Kim, Junhee Cho, Junhyeub Sun, Sungkwon Lee, Cheolkyu Bok, Seungchan Moon, and Jinwoong Kim "Optimization of material and process parameter for minimizing defect in implementation of MFHM process", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192Y (30 March 2007); https://doi.org/10.1117/12.712406

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