30 March 2007 Optimization of material and process parameter for minimizing defect in implementation of MFHM process
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Abstract
Silicon-containing material has recently attracted attention as new hard mask material. We have studied the applicability of MFHM (Multi-Functional Hard Mask)/SOC (Spin on Carbon) materials as an alternative to the BARC/SiON/ amorphous carbon (a-C) process. This process is very useful in terms of cost reduction and process simplicity compared to a-C process. Evaluation results have showed good lithographic and etch performances. However, this MFHM process has showed specific defects related to material. This paper will focus on defect type and suggest its solution.
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Kilyoung Lee, Kilyoung Lee, Junggun Heo, Junggun Heo, Keundo Ban, Keundo Ban, Hyungsuk Seo, Hyungsuk Seo, Geunsu Lee, Geunsu Lee, Wonkyu Kim, Wonkyu Kim, Junhee Cho, Junhee Cho, Junhyeub Sun, Junhyeub Sun, Sungkwon Lee, Sungkwon Lee, Cheolkyu Bok, Cheolkyu Bok, Seungchan Moon, Seungchan Moon, Jinwoong Kim, Jinwoong Kim, } "Optimization of material and process parameter for minimizing defect in implementation of MFHM process", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192Y (30 March 2007); doi: 10.1117/12.712406; https://doi.org/10.1117/12.712406
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