Radiation sensitive developable bottom anti-reflective coating (DBARC) for 193nm lithography: first generation

Medhat Toukhy; Joseph Oberlander; Salem Mullen; PingHung Lu; Mark Neisser

doi:10.1117/12.717114

23 March 2007 Radiation sensitive developable bottom anti-reflective coatings (DBARC) for 193nm lithography: first generation

Medhat Toukhy, Joseph Oberlander, Salem Mullen, PingHung Lu, Mark Neisser

Author Affiliations +

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651936 (2007) https://doi.org/10.1117/12.717114
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A first generation DBARC applicable for 1^st minimum 193nm lithography is described in this paper. The polymer used in this DBARC is insoluble in the casting solvent of the resist, which is propyleneglycolmonomethyletheracetate (PGMEA). Photo acid generator (PAG) and base extractions from the DBARC coating by the resist casting solvent were examined by the DBARC dissolution rates in the developer, before and after solvent treatments. Although the resist and the DBARC do not appear to intermix, strong interaction between the two is evident by their lithographic performance and dissolution rate study.

Citation Download Citation

Medhat Toukhy, Joseph Oberlander, Salem Mullen, PingHung Lu, and Mark Neisser "Radiation sensitive developable bottom anti-reflective coatings (DBARC) for 193nm lithography: first generation", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651936 (23 March 2007); https://doi.org/10.1117/12.717114

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