Automatic viscosity controlled production of photoresist

Woo Sok Chang; Christos Monovoukas; Michael Tanaka; Norbert Fronczak

doi:10.1117/12.717976

21 March 2007 Automatic viscosity controlled production of photoresist

Woo Sok Chang, Christos Monovoukas, Michael Tanaka, Norbert Fronczak

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65193N (2007) https://doi.org/10.1117/12.717976
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Viscosity of photoresist is an important product parameter because it determines film thickness during spin coating. Producers of photoresist, therefore, have established manufacturing procedures which require that fluid viscosity be measured several times during production to ensure product quality. Periodic samples are taken off-line to an analytical laboratory where viscosity is measured under controlled conditions. However, off-line measurements, interrupt production, engage valuable human resources, and fail to provide adequate process feedback. This paper describes the implementation of an automatic viscosity-controlled production process of photoresist using a unique in-line viscometer. The automated photoresist production process increases throughput and improves product quality. With sufficient accuracy and repeatability of the measurements, it is now possible to correlate and predict film thickness with viscosity values taken during photoresist production.

Citation Download Citation

Woo Sok Chang, Christos Monovoukas, Michael Tanaka, and Norbert Fronczak "Automatic viscosity controlled production of photoresist", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65193N (21 March 2007); https://doi.org/10.1117/12.717976

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