Exposure of molecular glass resist by e-beam and EUVIL

Cyril Vannuffel; Damien Djian; Serge Tedesco; Dimitra Niakoula; Panagiotis Argitis; Veroniki P. Vidali; Elias Couladouros; Harun Solak

doi:10.1117/12.714263

26 March 2007 Exposure of molecular glass resist by e-beam and EUVIL

Cyril Vannuffel, Damien Djian, Serge Tedesco, Dimitra Niakoula, Panagiotis Argitis, Veroniki P. Vidali, Elias Couladouros, Harun Solak

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Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651949 (2007) https://doi.org/10.1117/12.714263
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Molecular resist have potential interest for low CDs and LERs required in future lithography technology. The lithographic ability of one of them is exposed in this study, by e-beam and by EUV-IL. Work on process condition is described and leads to dense-lines resolution down to 32.5nm for.

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Cyril Vannuffel, Damien Djian, Serge Tedesco, Dimitra Niakoula, Panagiotis Argitis, Veroniki P. Vidali, Elias Couladouros, and Harun Solak "Exposure of molecular glass resist by e-beam and EUVIL", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651949 (26 March 2007); https://doi.org/10.1117/12.714263

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