Paper
13 October 1986 Micro-/Ultramicro Hardness Measurements with Insulating Films
H K Pulker, K Salzmann, C Reichert
Author Affiliations +
Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938370
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria
Abstract
Due to the definition of classical indentation hardness, the plastic behaviour of a material is investigated. But in the load-dependent range the influence of the elastic deformation also becomes noticeable. There is a remarkable difference between diagonal length and resulting hardness, in case of a pure dielectric and a dielectric with thin ductile metallic overcoat required for examination in a scanning electron microscope (SEM). According to the almost plastic behaviour of the overcoat, the diagonal length of the imprint produced by a diamond indenter under load, i.e. before elastic backformation, is "fixed". So it is necessary, in contradiction to investigations made with precoated dielectrics, to produce indents on the pure surface, for instance with Reichert-Jung Micro-Duromat 4000, and to measure them with a light microscope or, in the case of too small indents, with a SEM after coating with a thin conducting film.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H K Pulker, K Salzmann, and C Reichert "Micro-/Ultramicro Hardness Measurements with Insulating Films", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); https://doi.org/10.1117/12.938370
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Cited by 2 scholarly publications and 1 patent.
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KEYWORDS
Thin films

Scanning electron microscopy

Dielectrics

Metals

Gold

Diamond

Microscopes

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