Visit My Account to manage your email alerts.
Defects, overlay, and focus performance improvements with five generations of immersion exposure systems
Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications using RELACS shrink and corresponding OPC
Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations
Control of polarization and apodization with film materials on photomasks and pellicles for high NA imaging performance
Visualizing the impact of the illumination distribution upon imaging and applying the insights gained
Patterning with amorphous carbon spacer for expanding the resolution limit of current lithography tool
Ultra-low k1 oxide contact hole formation and metal filling using resist contact hole pattern by double L&S formation method