Future directions for CMOS device technology development from a system application perspective

Tak H. Ning

doi:10.1117/12.720629

27 March 2007 Future directions for CMOS device technology development from a system application perspective

Tak H. Ning

Author Affiliations +

Proceedings Volume 6520, Optical Microlithography XX; 652003 (2007) https://doi.org/10.1117/12.720629
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The development of CMOS technology has been, and will remain, driven by system needs. Traditionally, these needs have been met quite satisfactorily by simply reducing the physical size of the transistors as guided by the MOSFET scaling theory and increasing the chip-level integration density as anticipated from "Moore’s Law." Now that CMOS has reached its scaling limits, continued progress has to come from innovations beyond the traditional development paths, guided by anticipating and addressing system designers' concerns and needs. In this talk, we examine several opportunities for extending current CMOS technology to continue satisfying the needs of system designers.

Citation Download Citation

Tak H. Ning "Future directions for CMOS device technology development from a system application perspective", Proc. SPIE 6520, Optical Microlithography XX, 652003 (27 March 2007); https://doi.org/10.1117/12.720629

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