Current status of high-index immersion lithography development

Yasuhiro Ohmura; Toshiharu Nakashima; Hiroyuki Nagasaka; Ayako Sukegawa; Satoshi Ishiyama; Koichi Kamijo; Masahiko Shinkai; Soichi Owa

doi:10.1117/12.711252

26 March 2007 Current status of high-index immersion lithography development

Yasuhiro Ohmura, Toshiharu Nakashima, Hiroyuki Nagasaka, Ayako Sukegawa, Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, Soichi Owa

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Proceedings Volume 6520, Optical Microlithography XX; 652006 (2007) https://doi.org/10.1117/12.711252
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

High index immersion lithography (HIL) is one candidate for the next generation lithography technology following water immersion lithography. This technology may require only moderate changes of chip making processes and result in lower cost of ownership (CoO) compared with other technologies such as double processing, extreme ultra violet lithography (EUVL), and nano-imprinting, and other technologies. In this paper, the current status of high index lens material and immersion fluid development compared with our requirements is discussed considering microlithographic lens design feasibility and attainable NA.

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Yasuhiro Ohmura, Toshiharu Nakashima, Hiroyuki Nagasaka, Ayako Sukegawa, Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, and Soichi Owa "Current status of high-index immersion lithography development", Proc. SPIE 6520, Optical Microlithography XX, 652006 (26 March 2007); https://doi.org/10.1117/12.711252

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