26 March 2007 Current status of high-index immersion lithography development
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Abstract
High index immersion lithography (HIL) is one candidate for the next generation lithography technology following water immersion lithography. This technology may require only moderate changes of chip making processes and result in lower cost of ownership (CoO) compared with other technologies such as double processing, extreme ultra violet lithography (EUVL), and nano-imprinting, and other technologies. In this paper, the current status of high index lens material and immersion fluid development compared with our requirements is discussed considering microlithographic lens design feasibility and attainable NA.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiro Ohmura, Yasuhiro Ohmura, Toshiharu Nakashima, Toshiharu Nakashima, Hiroyuki Nagasaka, Hiroyuki Nagasaka, Ayako Sukegawa, Ayako Sukegawa, Satoshi Ishiyama, Satoshi Ishiyama, Koichi Kamijo, Koichi Kamijo, Masahiko Shinkai, Masahiko Shinkai, Soichi Owa, Soichi Owa, } "Current status of high-index immersion lithography development", Proc. SPIE 6520, Optical Microlithography XX, 652006 (26 March 2007); doi: 10.1117/12.711252; https://doi.org/10.1117/12.711252
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