27 March 2007 Process window and interlayer aware OPC for the 32-nm node
Author Affiliations +
Abstract
Pushing optical microlithography towards the 32nm node requires hyper-NA immersion optics in combination with advanced illumination, polarization, and mask technologies. Novel approaches in model-based optical proximity correction (OPC) and sub-resolution assist feature (SRAF) optimization are required to not only produce correct feature shapes at the nominal process condition but also to maintain edge placement tolerances within spec limits under process variations in order to ensure a finite process window. In addition, it is becoming increasingly important to consider interactions between multiple layers when performing correction in order to ensure electrical viability. In this paper we discuss the application of a model based process-window-aware and interlayer-aware integrated OPC system on 32nm node patterns. Process window awareness will be demonstrated for main feature correction by taking into account image-based modeling at multiple defocus and dose conditions. In addition, interlayer-awareness will be demonstrated by correction that takes into account the effects of active width on gate CD and of contact overlap with metal, gate, and active. The results show an improvement over "non-aware" OPC in gate CD control, in contact overlap, and in overall process margin. In addition, PW aware correction is demonstrated to prevent potential catastrophic failures at extreme PW conditions.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark Terry, Gary Zhang, George Lu, Simon Chang, Tom Aton, Robert Soper, Mark Mason, Shane Best, Bill Dostalik, Stefan Hunsche, Jiang Wei Li, Rongchun Zhou, Mu Feng, Jim Burdorf, "Process window and interlayer aware OPC for the 32-nm node", Proc. SPIE 6520, Optical Microlithography XX, 65200S (27 March 2007); doi: 10.1117/12.714442; https://doi.org/10.1117/12.714442
PROCEEDINGS
11 PAGES


SHARE
RELATED CONTENT

Etch correction and OPC a look at the current...
Proceedings of SPIE (March 29 2013)
Contact mask optimization and SRAF design
Proceedings of SPIE (March 16 2009)
Joining the design and mask flows for better and cheaper...
Proceedings of SPIE (December 06 2004)
Merits of cellwise model-based OPC
Proceedings of SPIE (May 03 2004)

Back to Top