High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches

R. H. French; V. Liberman; H. V. Tran; J. Feldman; D. J. Adelman; R. C. Wheland; W. Qiu; S. J. McLain; O. Nagao; M. Kaku; M. Mocella; M. K. Yang; M. F. Lemon; L. Brubaker; A. L. Shoe; B. Fones; B. E. Fischel; K. Krohn; D. Hardy; C. Y. Chen

doi:10.1117/12.712234

26 March 2007 High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches

R. H. French, V. Liberman, H. V. Tran, J. Feldman, D. J. Adelman, R. C. Wheland, W. Qiu, S. J. McLain, O. Nagao, M. Kaku, M. Mocella, M. K. Yang, M. F. Lemon, L. Brubaker, A. L. Shoe, B. Fones, B. E. Fischel, K. Krohn, D. Hardy, C. Y. Chen

Author Affiliations +

Proceedings Volume 6520, Optical Microlithography XX; 65201O (2007) https://doi.org/10.1117/12.712234
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

To identify the most practical and cost-effective technology after water immersion lithography (Gen1) for sub-45 nm half pitches, the semiconductor industry continues to debate the relative merits of water double patterning (feasible, but high cost of ownership), EUV (difficulties with timing and infrastructure issues) and high index immersion lithography (single-exposure optical lithography, needing a suitable high index last lens element [HILLE]). With good progress on the HILLE, high index immersion with numerical apertures of 1.55 or above now seems possible. We continue our work on delivering a commercially-viable high index immersion fluid (Gen2). We have optimized several fluids to meet the required refractive index and absorbance specifications at 193 nm. We are also continuing to examine other property/process requirements relevant to commercial use, such as fluid radiation durability, last lens element contamination and cleaning, resist interactions and profile effects, and particle contamination and prevention. These studies show that both fluid handling issues, as well as active fluid recycling, must be well understood and carefully managed to maintain optimum fluid properties. Low-absorbing third generation immersion fluids, with refractive indices above 1.7 (Gen3), would further expand the resolution of singleexposure 193 nm lithography to below 32 nm half pitch.

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R. H. French, V. Liberman, H. V. Tran, J. Feldman, D. J. Adelman, R. C. Wheland, W. Qiu, S. J. McLain, O. Nagao, M. Kaku, M. Mocella, M. K. Yang, M. F. Lemon, L. Brubaker, A. L. Shoe, B. Fones, B. E. Fischel, K. Krohn, D. Hardy, and C. Y. Chen "High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches", Proc. SPIE 6520, Optical Microlithography XX, 65201O (26 March 2007); https://doi.org/10.1117/12.712234

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