High-index fluoride materials for 193-nm immersion lithography

Teruhiko Nawata; Yoji Inui; Isao Masada; Eiichi Nishijima; Toshiro Mabuchi; Naoto Mochizuki; Hiroki Satoh; Tsuguo Fukuda

doi:10.1117/12.711045

27 March 2007 High-index fluoride materials for 193-nm immersion lithography

Teruhiko Nawata, Yoji Inui, Isao Masada, Eiichi Nishijima, Toshiro Mabuchi, Naoto Mochizuki, Hiroki Satoh, Tsuguo Fukuda

Author Affiliations +

Proceedings Volume 6520, Optical Microlithography XX; 65201P (2007) https://doi.org/10.1117/12.711045
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

BaLiF₃ single crystal has been studied as the lens material for the candidate of the next generation high index immersion lithography system. Although the refractive index of BaLiF₃ is 1.64 at 193nm which is not sufficient for the requirement, other optical properties such as 193nm transparency and laser durability might fulfill the requirement, and intrinsic birefringence is relatively lower than other candidate materials. It is estimated that the cause of scattering in the BaLiF₃ crystal is aggregation of excess LiF component. The special annealing process to eliminate excess LiF component was applied to improve the transparency. The internal transparency was improved to more than 97%/cm by optimizing growth conditions and annealing conditions.

Citation Download Citation

Teruhiko Nawata, Yoji Inui, Isao Masada, Eiichi Nishijima, Toshiro Mabuchi, Naoto Mochizuki, Hiroki Satoh, and Tsuguo Fukuda "High-index fluoride materials for 193-nm immersion lithography", Proc. SPIE 6520, Optical Microlithography XX, 65201P (27 March 2007); https://doi.org/10.1117/12.711045

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